Upcoming Trade Shows

2013 Amcon

pLANO, tx

  • Tuesday, September 17th 9:30 AM - 3:30 PM
  • Wednesday, September 18th, 9:30 AM - 3:00 PM

 Salt lake city, ut

  • Tuesday October 29th, 9:30 AM- 3:30 PM at the Salt Convention Center.
  • Wednesday October 30th, 9:30 AM - 3:00 PM at the Salt Convention Center.


(Electron, Ion, photon, beam & nanotechnology)

  • Venue: JW Marriott Resort
  • Location: Las Vegas, Nevada
  • Date: May 31 - June 3, 2011
  • Industry: Semiconductor

Event Profile

The EIPBN Conference is recognized as the foremost international meeting dedicated to lithographic science and technology and its application to micro and nanofabrication techniques. The conference brings together engineers and scientists from industries and universities from all over the world to discuss recent progress and future trends.


  • Venue: Moscone Convention Center         
  • Location: San Francisco, California
  • Date: July 10 - 12, 2012
  • Industry: Semiconductor

Event Profile

Semicon West is the premier annual industry event for the global microelectronics industries in North America. Semicon West offers a series of technical conferences, business programs, standards workshops and industry networking events for the regional semiconductor community.

Pictures From SEMICON 2010


Spie photomast technology

  • Venue: Monterey Conference Center
  • Location: Monterey, California
  • Dates: September 19 - 22, 2011
  • Industry: Semiconductor

Event Profile

In a weakly recovering economy it is more important than ever that you reach as many of your customers as possible. As the most recognized international meeting for presenting innovations in the mask-making industry, SPIE Photomask Technology is the event for the people, institutions, and companies driving this critical and influential business.

EMLC (european Mask and lithography)

  • Venue: Hilton Hotel
  • Location: Dresden, Germany
  • Dates: January 17 - 18, 2012
  • Industry: Semiconductor

Event Profile

The focus of this two-day conference is state-of-the-art of mask technology and lithography, such as mask manufacturing, mask business, lithography and mask applications, emerging mask & lithography echnologies, and mask & lithography equipment.
This conference has annually brought together scientists, researchers, engineers and developers from around the world to present papers at the forefront of research, manufacturing and application. It provides a place where mask makers, mask users, and their tool suppliers become acquainted with new developments and results.

Spie advanced lithography

  • Venue: San Jose Convention Center and San Jose Marriott
  • Location: San Jose, California
  • Dates: February 12 - 16, 2012
  • Industry: Semiconductor

Event Profile

For the past 36 years, SPIE Advanced Lithography symposium has played a key role in bringing the lithography community together to solve challenges required by the semiconductor industry. With the addition of a new conference in 2012 covering advanced etching and related processes, the total spectrum of lithographic patterning technology is presented across seven complementary conferences. Symposium participants come from an extensive array of backgrounds to share and learn about state-of-the-art lithographic tools, resists, metrology, materials characterization, and design and process integration. Through a series of provocative panel discussions and seminars, the symposium further probes current issues to be faced as we extend these technologies or try to switch to alternative technologies.

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